This paper introduces dual-material gate (DMG) configuration on a bilayer graphenenanoribbon field-effect transistor (BLGNRFET). Its device characteristics based on nonequilibrium Green's function (NEGF) are explored and compared with a conventionalsingle-material gate BLGNRFET. Results reveal that an on-off ratio of up to 10 is achievableas a consequence of both higher saturation and lower leakage currents. The advantages ofour proposed DMG structure mainly lie in higher carrier transport efficiency by means ofenhancing initial acceleration of incoming carriers in the channel region and thesuppression of short channel effects. Drain-induced barrier lowering, subthreshold swingand hot electron effect as the key short channel parameters have been improved in theDMG-based BLGNRFET.