Solid-state thermoelectric (TE) micro-devices have been frequently studied in recent [1-4]. Unfortunately, many non-idealities become apparent and must be considered when moving from bulk to thin-film devices. Whereas electrical and thermal contact resistance and heat generation in the current carrying connections all become critical for thin-film devices [5]. For practically achievable values of modern Bi2Te3 heat exchangers, the impact of modern parasitic resistances results in a 50% reduction in the figure of merit at length scales less than w0.5 mm [6]. Some of the highest performing thin-film TE materials with material ZT values in excess of 2 only achieve device performance equivalent to a material ZT of less than 0.4 when all the passive losses inherent to the device design are taken into account [7,8], i.e. an effective de-vice ZT < 0.4. Joule heating at the metal-semiconductor interface has been a primary component in the reduction of theoretical cooling predictions by as much as 97% [5,9]. The contact resistance for thin-film device is a bottleneck, which badly confines the performance of TE micro-devices. To overcome this issue, numerous