Fig. 3 shows AFM images of the seed layer with different
thicknesses along with corresponding roughness graphs. As can be
seen, for the seed layer with 20 nm thickness (Fig. 3A), the surface
has maximum roughness frequency (number of peaks and troughs
per unit length) and, according to Fig. 1E, nanorods grown on this
seed layer are not well-aligned; moreover, with increase of thickness
to 40 nm (Fig. 3B), roughness frequency decreases and
according to Fig. 1F, the alignment of nanorods improves.
Finally, with increase of seed layer thickness to 320 nm (Fig. 3D),
the surface has minimum roughness frequency and nanorods with
much better alignment are obtained (Fig. 1H).
The average roughness of the seed layer measured from the
surface profiler is shown in Fig. 4.
Fig. 3 shows AFM images of the seed layer with differentthicknesses along with corresponding roughness graphs. As can beseen, for the seed layer with 20 nm thickness (Fig. 3A), the surfacehas maximum roughness frequency (number of peaks and troughsper unit length) and, according to Fig. 1E, nanorods grown on thisseed layer are not well-aligned; moreover, with increase of thicknessto 40 nm (Fig. 3B), roughness frequency decreases andaccording to Fig. 1F, the alignment of nanorods improves.Finally, with increase of seed layer thickness to 320 nm (Fig. 3D),the surface has minimum roughness frequency and nanorods withmuch better alignment are obtained (Fig. 1H).The average roughness of the seed layer measured from thesurface profiler is shown in Fig. 4.
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