and ψ6,ave is in the range of 0 to 1, spanning no local hexagonal
symmetry between particle neighbors to a long-range hexagonally
close-packed crystal. For the fixedR)45°, Figure 7a shows that
Favg slowly decreases with increasing deposition speed and drops
significantly for speeds above Vmono ) 45 μm/s. With regard to
the local order, ψ6,ave is highest at a speed of Vmono ) 30 μm/s,
the optimal deposition speed for a thin film monolayer. Samples
generated below Vmono show only a slight degree of disorder, but
they are the analysis of the first layer of a multilayer deposition.
Samples fabricated above 30 μm/s demonstrate a significant
reduction in ψ6,ave, although the density does not significantly
decrease until the deposition rate is above 45 μm/s. This indicates
that the local order is highly sensitive to changes in the density
and the number of defects grows substantially at deposition lower
than Vmono. When the sample is clearly a submonolayer, above
45 μm/s, the particles are distributed randomly, similar to the left
image in Figure 6a.