First of all, it removes excess water and other solvents which would
affect both exposure and development. Furthermore, it
increases the etch resistance and improves the adhesion
between photoresist and the layer underneath it.the metallization system can be patterned by etching. However,
stacking would require much more complicated metallization
schemes, suitable for example as under bump
metallization or top surface metallization for solder bumps
[7]. Such metallization systems usually consist of several