Table 1 shows the element content and the thickness as a function
of deposition temperature. It can be seen that the thickness of
the thin film decreases with the increasing deposition temperature.
The composition of Co is less at low temperature and high
temperature. But it closes in the middle temperature. XRD patterns
of antimonide cobalt thin films are shown in Fig. 1. It is found that
sample S1 and S2 mainly exhibit the Sb phase due to the highest
dominated peak is from the diffraction of the Sb (012) plane. Some
peaks locate at 31, 42 and 52 is related to the CoSb3 phase
which indicates that the CoSb3 is the secondary phase of the thin
films. Besides this, few extra diffraction peaks are confirmed as
CoSb2 phase. But the intensity of those peaks is very weaker than
others. When the substrate temperature increased to 300 C, the
peaks of S3–S6 relate to Sb (012) phase is disappeared and the
intensity of the diffraction peaks locate at 32 and 34 rapidly
increase. They are corresponding to the CoSb2 phase and become
to the mainly diffraction peaks of the thin films. Though some diffraction
peaks relate to Sb and CoSb3 phase are still observed, their
intensity is much smaller than those peaks. This indicates that
CoSb2 is the dominant phase of the thin films deposited at 300–
450 C. However, the Sb phase appears to be the dominated phase
and the CoSb3 become the secondary phase again since the thin
film was prepared at the substrate temperature of 500 C. From
the XRD results, it can be concluded that antimonide cobalt thin
films with Sb and CoSb3 mixed phase are obtained when the thin
films deposited at low temperate. Then, they are translated to be
CoSb2 phase which can be consider as the single phase of the thin
films when the temperature increased above 300 C. Finally, the
structure of the thin film resumes to Sb and CoSb3 mixed phase
at 500 C which is similar to the thin films deposited at low
temperature.
Table 1 shows the element content and the thickness as a function
of deposition temperature. It can be seen that the thickness of
the thin film decreases with the increasing deposition temperature.
The composition of Co is less at low temperature and high
temperature. But it closes in the middle temperature. XRD patterns
of antimonide cobalt thin films are shown in Fig. 1. It is found that
sample S1 and S2 mainly exhibit the Sb phase due to the highest
dominated peak is from the diffraction of the Sb (012) plane. Some
peaks locate at 31, 42 and 52 is related to the CoSb3 phase
which indicates that the CoSb3 is the secondary phase of the thin
films. Besides this, few extra diffraction peaks are confirmed as
CoSb2 phase. But the intensity of those peaks is very weaker than
others. When the substrate temperature increased to 300 C, the
peaks of S3–S6 relate to Sb (012) phase is disappeared and the
intensity of the diffraction peaks locate at 32 and 34 rapidly
increase. They are corresponding to the CoSb2 phase and become
to the mainly diffraction peaks of the thin films. Though some diffraction
peaks relate to Sb and CoSb3 phase are still observed, their
intensity is much smaller than those peaks. This indicates that
CoSb2 is the dominant phase of the thin films deposited at 300–
450 C. However, the Sb phase appears to be the dominated phase
and the CoSb3 become the secondary phase again since the thin
film was prepared at the substrate temperature of 500 C. From
the XRD results, it can be concluded that antimonide cobalt thin
films with Sb and CoSb3 mixed phase are obtained when the thin
films deposited at low temperate. Then, they are translated to be
CoSb2 phase which can be consider as the single phase of the thin
films when the temperature increased above 300 C. Finally, the
structure of the thin film resumes to Sb and CoSb3 mixed phase
at 500 C which is similar to the thin films deposited at low
temperature.
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