Actual mirror polishing progresses through material removal ranging from the minimum scale of an atom or molecule to the large scale of clusters from the minimum scale of an atom or molecule to the large scale of clusters of atoms/molecules. If material removal progresses along the motion locus of abrasives and projecting areas of the polisher holding abrasives, it is possible to produce surface textures similar to the directional ridges in a cultivated field as in a diffraction grating. Taking the crossing of polishing motion into account, it is also possible to change it into pyramid like or conelike arrangements. Traces of such material removal on polished surfaces may be present, and beneath them are damaged layers of disordered atomic arrangement, which may affect atomic layers from several layers to a few hundred layers down from the surface. Surface quality could be improved by making the surface texture finer. It is important to use fine abrasives and fine-textured polishers. As mentioned earlier, the existence of large particles in the slurry and irregularities on the polisher leads to the deterioration of surface quality. Figure 6.17 shows a conceptualized relation between large particles and surface toughness. When a polishing machine is installed in a dusty environment, the quality of the worked surface deteriorates as polishing advances because of the dust-drenched conditions [23].