High-power impulse magnetron sputtering (HiPIMS)or sometimes referred to as high power pulsed magnetron sputtering (HPPMS) introduced by Kouznetsov et al.in 1999 is a promising technique for improving magnetron sputtering by the addition of pulsed power technology.To distinguish this technique from other pulsed magnetron processes, we use a similar definition as that of Anders :HiPIMS is pulsed magnetron sputtering, where the peak power exceeds the time-averaged power by typically two orders of magnitude. In addition, the HiPIMS technology has recently been industrially upscaled by several big