We demonstrate a novel innovative approach to obtain crystalline GOI structure on Si by introducing MLG template for the first time.Orientation controlled large and wide(111)Ge single-
crystal strip was obtained on graphene on insulator platform.The possible growth mechanism was proposed. This innovative technique will open up new vistas for developing Ge-based transfer-able devices by utilizing the flexibility of atomically thin graphene layers to facilitate the next-generation ultra-large-scale integrated circuits (ULSIs) with multifunctionalities