to study the radiation resistance and damage of optical
fiber towards ion beams, SiO2 quartz glass was irradiated
with 1 and 2.5 MeV H+ beam to fluence of 1015 and
1016 cm 2. The spatial distribution in depth direction and
the density of defects were investigated by means of
micro-fluorescence spectroscopy and ESR. The depth profile of micro-fluorescence due to O3 showed good agreement with that of energy deposition as determined with
the SRIM code. The ESR detected a signal assigned to Si
radical. The yield was evaluated and increased with stopping power. These data would be of importance to evaluate
radiation damage and resistance of optical fiber in radiation environment