A texturedsiliconseedlayeronaglasssubstratewasgrown
from anAl–Si eutecticmeltlayerat725 °C viae-beamevaporation.
A smooth,thin,and flexibleglasswitharelativelyelevatedglass
transition temperaturewasusedasthesubstratematerialforthis
investigation.Priorto film deposition,theglasssubstrateswere
cleaned bythestandardRCAprocedureanddippedina2%HF-
solution for30s(GORKA).Aluminumpellets(99.999%inpurity,
KurtJLesker)andsiliconpellets(99.999%inpurity,KurtJLesker)
wereusedasthethermalevaporatorande-beamevaporator
materialsources,respectively.Usingathermalevaporator,Allay-
ers varyingfrom30to100nminthicknessweredepositedonto
glass substratesundermoderatevacuumconditionsof105 Torr.
The samplewasremovedfromthethermalevaporator,placedinto
the electronbeamevaporatorandtakentobasevacuumlevelsof
107 Torr.ASi film of200nmthickwassubsequentlydeposited
onto theAlbaselayerwhilethesubstratewasheldat725 °C. The
deposition rateofSiwasheldconstantat6nm/min.Thicknesses
weretakenfromaquartzcrystalmicrobalance(QCM)reading
A texturedsiliconseedlayeronaglasssubstratewasgrownfrom anAl–Si eutecticmeltlayerat725 °C viae-beamevaporation.A smooth,thin,and flexibleglasswitharelativelyelevatedglasstransition temperaturewasusedasthesubstratematerialforthisinvestigation.Priorto film deposition,theglasssubstrateswerecleaned bythestandardRCAprocedureanddippedina2%HF-solution for30s(GORKA).Aluminumpellets(99.999%inpurity,KurtJLesker)andsiliconpellets(99.999%inpurity,KurtJLesker)wereusedasthethermalevaporatorande-beamevaporatormaterialsources,respectively.Usingathermalevaporator,Allay-ers varyingfrom30to100nminthicknessweredepositedontoglass substratesundermoderatevacuumconditionsof105 Torr.The samplewasremovedfromthethermalevaporator,placedintothe electronbeamevaporatorandtakentobasevacuumlevelsof107 Torr.ASi film of200nmthickwassubsequentlydepositedonto theAlbaselayerwhilethesubstratewasheldat725 °C. Thedeposition rateofSiwasheldconstantat6nm/min.Thicknessesweretakenfromaquartzcrystalmicrobalance(QCM)reading
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