Crystalline Siaccountsformorethan90%ofthesolarcells
produced todayandabout95%ofthosecellsarefabricatedon
p-type Si [1]. Thisisbecauseofthewell-establishedtechnology
and equipmentbaseforp-typecellfabricationandlowerwafer
and cellprocessingcostcomparedton-typecells.However,p-type
wafersgenerallyhavelowerbulklifetimeandaremoresuscep-
tible tometalimpuritiescomparedtothen-typewafers [2,3]. It
has beenreportedthattheminoritycarrierlifetimeinp-typeSiis
frequentlylimitedbyironrelateddefects [2,4] with largerelectron
capturecrosssectioncomparedtohole [5]. Ironisoftenpresentin
the feedstockmaterialandcanbeintroducedduringprocessing
[6]. Therefore,majorityofthePVindustrycurrentlyusesPOCl3
diffusion toremovemetalimpuritiesincludingiron [7–11]. POCl3
getteringisattributedtotheformationofmisfit dislocationson
the surfacewhichprovidethesinkforimpuritygettering.Inad-
dition, higherphosphorussurfaceconcentrationenhances
getteringbecauseitincreasessolidsolubilityandsegregation
coefficient ofmetalimpurities [7–17]. Thephosphorusion-im-
planted emitterhasrecentlyshownhigherperformanceduetoin-
situ oxidepassivationduringtheimplantannealingprocess
[18,19]. However,itsgetteringqualityisnotfullyunderstoodand
compared withPOCl3 diffusion. Thispaperconductsasystematic
and controlledstudytocomparetheimpactofphosphorusion-
implantation andPOCl3 diffusion inducedgetteringoncastquasi-
mono andCzochralski(Cz)Sisolarcells.