In order to overcome these problems, ternary nitride thin films with the addition of other elements into binary system have been developed, and their superior properties to the binary nitride system have been reported in many papers. Among these films, Cr-based ternary nitride coatings such as Cr-Ti-N [3], Cr-Al-N [4], Cr-W-N [5], Cr-Si-N [6], and Cr-Zr-N [7-9] have been extensively studied due to high temperature oxidation resistance of CrN films, especially Cr-Zr-N films.