For the experiments presented in this paper the following parameters were used: source temperature Tso=625 °C, substrate temperature Tsub=535 °C, source–substrate distance d=3 mm, dynamic argon (Air Liquide, 5.0) pressure p=1.5 mbar.
To reduce the influence of residual water or oxygen, the complete reactor was evacuated and afterwards flushed with argon. This procedure was repeated three times before the graphite blocks were irradiated. After reaching Tso and Tsub the deposition process was initiated by reducing the pressure. After the deposition, the reactor was immediately flooded with argon and the lamps were switched off. Pretests showed no deposition at atmospheric pressure. Hence, pressure regulation is applicable for deposition control.
The duration tCSS of the process was varied adequately in the range between 5 and 20 min for the determination of deposition rates. Films with commercial powder and nanostructured powder as source material were deposited this way. In the following the obtained test series are labeled with A and B, respectively.
A second way of coating with nanostructured powder (series C) was carried out in steps. Each deposition step had a maximum duration of 5 min until the reactor was cooled down and new CdTe powder was filled in the source. Subsequently the deposition on the previous film was continued after each step.
For each of the three cases the same amount of source material was used.
The obtained films were characterized by gracing incidence XRD with a BRUKER AXS D8 Advance diffractometer. To determine the thickness of the films the coated substrates were broken, the edges were sputtered with gold and analyzed via SEM.
For the experiments presented in this paper the following parameters were used: source temperature Tso=625 °C, substrate temperature Tsub=535 °C, source–substrate distance d=3 mm, dynamic argon (Air Liquide, 5.0) pressure p=1.5 mbar.
To reduce the influence of residual water or oxygen, the complete reactor was evacuated and afterwards flushed with argon. This procedure was repeated three times before the graphite blocks were irradiated. After reaching Tso and Tsub the deposition process was initiated by reducing the pressure. After the deposition, the reactor was immediately flooded with argon and the lamps were switched off. Pretests showed no deposition at atmospheric pressure. Hence, pressure regulation is applicable for deposition control.
The duration tCSS of the process was varied adequately in the range between 5 and 20 min for the determination of deposition rates. Films with commercial powder and nanostructured powder as source material were deposited this way. In the following the obtained test series are labeled with A and B, respectively.
A second way of coating with nanostructured powder (series C) was carried out in steps. Each deposition step had a maximum duration of 5 min until the reactor was cooled down and new CdTe powder was filled in the source. Subsequently the deposition on the previous film was continued after each step.
For each of the three cases the same amount of source material was used.
The obtained films were characterized by gracing incidence XRD with a BRUKER AXS D8 Advance diffractometer. To determine the thickness of the films the coated substrates were broken, the edges were sputtered with gold and analyzed via SEM.
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