The processing seminar series offered by the training program
has constantly challenged device researchers at MiRC for their
processing techniques. For example, a Lithography and Mask
Making at MiRC seminar given in February 2002 sprouted a
mask-making frenzy in the following months (Fig. 10) which is
obvious evidence of the researchers’ desires to develop smaller
and more complicated microelectronics devices at MiRC. Given
the fact that many research groups either did not possess the
technology of optical lithography or did not know how to design
and construct a fine mask, the processing training offered
a better technique for their research.