Surface characterization methods and processes
In order to characterize the surfaces, tapping mode AFM was used (Nano Magnetics Instruments, Oxford, UK). The surfaces were installed on sample holder. 2 μm × 2 μm sample area was showed with a 128 × 128 pixels resolution. The scan rate was 2 μm s− 1. The studies were performed in air atmosphere.
Infrared spectra were recorded directly from the film deposited on GC surface in a Bruker-Tensor 27 FTIR spectrometer (Bruker Optics Inc., Ettlingen, Germany).
XPS analysis was performed on a PHI 5000 Versa Probe (Φ ULVAC-PHI. Inc., Japan/USA) model X-ray photoelectron spectrometer with monochromatized Al Kα radiation (1486.6 eV) as an X-ray anode operated at 50 W. The pressure inside the analyzer was maintained at 10− 7 Pa.
A fine wet emery paper (grain size 4000) was used to clean and prepare the GC electrodes by polishing to a mirror-like finish with. They were polished successively in 0.1 μm and 0.05 μm alumina slurries (Baikowski Int. Corp. USA) on microcloth pads (Buehler, Lake Bluff, IL, USA). Firstly the electrodes were sonicated in ultra pure water two times and then 50:50 (v/v) isopropyl alcohol and acetonitrile (IPA + MeCN) solution purified over activated carbon. GC electrode was rinsed with MeCN to remove any physisorbed, unreacted materials from the surface after removal of trace alumina from the surface by rinsing with water and brief cleaning in an ultrasonic bath (Bandelin RK 100, Germany) with water then IPA + MeCN mixture purified over the activated carbon. The electrodes were dried with an argon gas flow before derivatization. Surface derivatization of GC electrodes was performed in a solution of 1.0 mM 2-TBI in 0.1 M TBATFB in MeCN as background electrolyte vs. Ag/Ag+ (0.01 M) reference electrode using CV with a scan rate of 100 mV/s between + 0.5 V and + 2.6 V. 2-TBI/GC electrode was characterized by CV, EIS, RAIRS, XPS and AFM and the results were compared with the results recorded by bare GC electrode. The CV characterization of electrodes was performed in the presence of 1.0 mM of K3[Fe(CN)6] in 0.1 M KCl and 1.0 mM of ferrocene in MeCN containing 0.1 M of TBATFB, as redox probes.
The complexation-ability of 2-TBI layer with Cd(II) ions was tested according to this protocol: the 2-TBI/GC electrode was incubated in Cd(II) ion solutions with varying concentrations ranging from 1.0 × 10− 11 to 2.5 × 10− 10 M for 25 min while mixing. The metal ions bounded to 2-TBI layer formed on electrode surface were detected by adsorptive stripping voltammetry in square wave mode. For this aim the working electrode was Cd(II)-modified 2-TBI/GC (Cd(II)/2-TBI/GC), Ag/AgCl/KClsat was used as a reference electrode and the counter electrode was Pt wire. Firstly Cd(II) ions, which were bonded to 2-TBI/GC electrode by complexation in open circuit potential for 25 min, were reduced to metallic cadmium under − 1.50 V in sodium acetate/acetic acid buffer solution of pH 5.0. Secondly, metallic cadmium at the electrode surface was oxidized to Cd(II) during the potential sweep from − 1.50 to − 0.60 V, resulting in a stripping peak at − 0.85 V. Finally, the stripping peak current was measured for Cd(II).
Surface characterization methods and processesIn order to characterize the surfaces, tapping mode AFM was used (Nano Magnetics Instruments, Oxford, UK). The surfaces were installed on sample holder. 2 μm × 2 μm sample area was showed with a 128 × 128 pixels resolution. The scan rate was 2 μm s− 1. The studies were performed in air atmosphere.Infrared spectra were recorded directly from the film deposited on GC surface in a Bruker-Tensor 27 FTIR spectrometer (Bruker Optics Inc., Ettlingen, Germany).XPS analysis was performed on a PHI 5000 Versa Probe (Φ ULVAC-PHI. Inc., Japan/USA) model X-ray photoelectron spectrometer with monochromatized Al Kα radiation (1486.6 eV) as an X-ray anode operated at 50 W. The pressure inside the analyzer was maintained at 10− 7 Pa.A fine wet emery paper (grain size 4000) was used to clean and prepare the GC electrodes by polishing to a mirror-like finish with. They were polished successively in 0.1 μm and 0.05 μm alumina slurries (Baikowski Int. Corp. USA) on microcloth pads (Buehler, Lake Bluff, IL, USA). Firstly the electrodes were sonicated in ultra pure water two times and then 50:50 (v/v) isopropyl alcohol and acetonitrile (IPA + MeCN) solution purified over activated carbon. GC electrode was rinsed with MeCN to remove any physisorbed, unreacted materials from the surface after removal of trace alumina from the surface by rinsing with water and brief cleaning in an ultrasonic bath (Bandelin RK 100, Germany) with water then IPA + MeCN mixture purified over the activated carbon. The electrodes were dried with an argon gas flow before derivatization. Surface derivatization of GC electrodes was performed in a solution of 1.0 mM 2-TBI in 0.1 M TBATFB in MeCN as background electrolyte vs. Ag/Ag+ (0.01 M) reference electrode using CV with a scan rate of 100 mV/s between + 0.5 V and + 2.6 V. 2-TBI/GC electrode was characterized by CV, EIS, RAIRS, XPS and AFM and the results were compared with the results recorded by bare GC electrode. The CV characterization of electrodes was performed in the presence of 1.0 mM of K3[Fe(CN)6] in 0.1 M KCl and 1.0 mM of ferrocene in MeCN containing 0.1 M of TBATFB, as redox probes.The complexation-ability of 2-TBI layer with Cd(II) ions was tested according to this protocol: the 2-TBI/GC electrode was incubated in Cd(II) ion solutions with varying concentrations ranging from 1.0 × 10− 11 to 2.5 × 10− 10 M for 25 min while mixing. The metal ions bounded to 2-TBI layer formed on electrode surface were detected by adsorptive stripping voltammetry in square wave mode. For this aim the working electrode was Cd(II)-modified 2-TBI/GC (Cd(II)/2-TBI/GC), Ag/AgCl/KClsat was used as a reference electrode and the counter electrode was Pt wire. Firstly Cd(II) ions, which were bonded to 2-TBI/GC electrode by complexation in open circuit potential for 25 min, were reduced to metallic cadmium under − 1.50 V in sodium acetate/acetic acid buffer solution of pH 5.0. Secondly, metallic cadmium at the electrode surface was oxidized to Cd(II) during the potential sweep from − 1.50 to − 0.60 V, resulting in a stripping peak at − 0.85 V. Finally, the stripping peak current was measured for Cd(II).
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Surface characterization methods and processes
In order to characterize the surfaces, tapping mode AFM was used (Nano Magnetics Instruments, Oxford, UK). The surfaces were installed on sample holder. 2 μm × 2 μm sample area was showed with a 128 × 128 pixels resolution. The scan rate was 2 μm s− 1. The studies were performed in air atmosphere.
Infrared spectra were recorded directly from the film deposited on GC surface in a Bruker-Tensor 27 FTIR spectrometer (Bruker Optics Inc., Ettlingen, Germany).
XPS analysis was performed on a PHI 5000 Versa Probe (Φ ULVAC-PHI. Inc., Japan/USA) model X-ray photoelectron spectrometer with monochromatized Al Kα radiation (1486.6 eV) as an X-ray anode operated at 50 W. The pressure inside the analyzer was maintained at 10− 7 Pa.
A fine wet emery paper (grain size 4000) was used to clean and prepare the GC electrodes by polishing to a mirror-like finish with. They were polished successively in 0.1 μm and 0.05 μm alumina slurries (Baikowski Int. Corp. USA) on microcloth pads (Buehler, Lake Bluff, IL, USA). Firstly the electrodes were sonicated in ultra pure water two times and then 50:50 (v/v) isopropyl alcohol and acetonitrile (IPA + MeCN) solution purified over activated carbon. GC electrode was rinsed with MeCN to remove any physisorbed, unreacted materials from the surface after removal of trace alumina from the surface by rinsing with water and brief cleaning in an ultrasonic bath (Bandelin RK 100, Germany) with water then IPA + MeCN mixture purified over the activated carbon. The electrodes were dried with an argon gas flow before derivatization. Surface derivatization of GC electrodes was performed in a solution of 1.0 mM 2-TBI in 0.1 M TBATFB in MeCN as background electrolyte vs. Ag/Ag+ (0.01 M) reference electrode using CV with a scan rate of 100 mV/s between + 0.5 V and + 2.6 V. 2-TBI/GC electrode was characterized by CV, EIS, RAIRS, XPS and AFM and the results were compared with the results recorded by bare GC electrode. The CV characterization of electrodes was performed in the presence of 1.0 mM of K3[Fe(CN)6] in 0.1 M KCl and 1.0 mM of ferrocene in MeCN containing 0.1 M of TBATFB, as redox probes.
The complexation-ability of 2-TBI layer with Cd(II) ions was tested according to this protocol: the 2-TBI/GC electrode was incubated in Cd(II) ion solutions with varying concentrations ranging from 1.0 × 10− 11 to 2.5 × 10− 10 M for 25 min while mixing. The metal ions bounded to 2-TBI layer formed on electrode surface were detected by adsorptive stripping voltammetry in square wave mode. For this aim the working electrode was Cd(II)-modified 2-TBI/GC (Cd(II)/2-TBI/GC), Ag/AgCl/KClsat was used as a reference electrode and the counter electrode was Pt wire. Firstly Cd(II) ions, which were bonded to 2-TBI/GC electrode by complexation in open circuit potential for 25 min, were reduced to metallic cadmium under − 1.50 V in sodium acetate/acetic acid buffer solution of pH 5.0. Secondly, metallic cadmium at the electrode surface was oxidized to Cd(II) during the potential sweep from − 1.50 to − 0.60 V, resulting in a stripping peak at − 0.85 V. Finally, the stripping peak current was measured for Cd(II).
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พื้นผิวลักษณะวิธีการและกระบวนการ
เพื่อลักษณะพื้นผิวแตะโหมด AFM ใช้อุปกรณ์แม่เหล็กนาโน , Oxford , UK ) พื้นผิวที่ถูกติดตั้งในตัวอย่าง ผู้ถือ 2 μ m × 2 μเมตรพื้นที่ตัวอย่างที่พบ กับ 128 × 128 พิกเซลความละเอียด อัตราการสแกน 2 μ M s − 1 การศึกษามีการปฏิบัติในบรรยากาศอากาศ
อินฟราเรดสเปกตรัมที่ถูกบันทึกไว้ได้โดยตรงจากภาพยนตร์ฝากบนพื้นผิว GC ในบรุคเกอร์เมตริกซ์ 27 ( Spectrometer ( BRUKER ทัศนศาสตร์อิงค์ Ettlingen เยอรมนี ) .
XPS การวิเคราะห์บนเกาะพีพี 5000 ในทางกลับกันโพรบ ( Φ ulvac-phi . อิงค์ , ญี่ปุ่น / อเมริกา ) โมเดล X-ray photoelectron สเปคโตรมิเตอร์ กับ monochromatized อัลเคαรังสี ( 1486.6 EV ) เช่น เอ็กซเรย์ โดยดำเนินการ 50 W .ความดันภายในเครื่องไว้ที่ 10 − 7 .
ทรายเปียกดี กระดาษ ( ขนาดเม็ด 4000 ) ถูกใช้เพื่อทำความสะอาด และเตรียมขั้วไฟฟ้าโดย GC polishing กระจกชอบจบ พวกเขาถูกขัดอย่างต่อเนื่องใน 0.1 M และ 0.05 μμ M มินา slurries ( baikowski int USA ) microcloth pads ( บิวเลอร์ , ทะเลสาบทู่ , IL , USA )ประการแรกคือ sonicated ขั้วไฟฟ้าในระบบน้ำบริสุทธิ์ 2 ครั้ง และก็ 50 : 50 ( v / v ) และไอโซโพรพิลแอลกอฮอล์ Acetonitrile ( IPA mecn ) โซลูชั่นที่บริสุทธิ์กว่าคาร์บอน GC ล้างด้วยขั้วไฟฟ้าลบ physisorbed mecn ,เข้าสู่วัสดุจากพื้นผิวหลังจากการกำจัดร่องรอยมินาจากพื้นผิวโดยการล้างด้วยน้ำ สะอาด สั้นๆ ในอ่างอาบน้ำด้วย ( bandelin RK 100 , เยอรมนี ) กับน้ำแล้วท่าน mecn ส่วนผสมบริสุทธิ์กว่าคาร์บอน ขั้วไฟฟ้าแห้งด้วยอาร์กอนก๊าซไหลก่อนกับ . กับผิวของขั้วไฟฟ้าคือใช้ GC ในสารละลาย 10 มม. 2-tbi ใน 0.1 M tbatfb mecn เป็นอิเล็กโทรไลต์ในพื้นหลังกับเอจี / AG ( 0.01 M ) ขั้วไฟฟ้าอ้างอิงโดยใช้ CV กับสแกนอัตรา 100 MV / s ระหว่าง 0.5 V และ 2.6 V 2-tbi / GC ขั้วมีลักษณะของ rairs , CV , XPS และ AFM และเปรียบเทียบกับผลลัพธ์บันทึก โดย : GC เปลือย คุณสมบัติของขั้วไฟฟ้า CV ในการปฏิบัติตนของ 10 มม. ของ K3 [ Fe ( CN ) 6 ] ใน 0.1 M KCl และ 1.0 มม. ของเฟอร์โรซีนใน mecn ที่มีความเข้มข้น 0.1 M ของ tbatfb เป็นปฏิกิริยารีดอกซ์ โพรบ
การความสามารถของชั้น 2-tbi ซีดีไอออนถูกทดสอบ ตามขั้นตอนดังนี้ 2-tbi / GC ขั้วไฟฟ้า ( 2 ) ซีดี ) ไอออนโซลูชั่นที่มีความเข้มข้นแตกต่างกันตั้งแต่ 1.0 × 10 −× 10 − 10 11 2.5 M สำหรับ 25 นาทีในขณะผสมโลหะไอออนล้อมรอบ 2-tbi ชั้นที่เกิดบนพื้นผิวขั้วไฟฟ้าถูกตรวจพบโดยการดูดติดผิวแสงยูวีในโหมดคลื่นสี่เหลี่ยม สำหรับจุดมุ่งหมายนี้ไฟฟ้าทำงานเป็นซีดี ( 2 ) ดัดแปลง 2-tbi / GC ( Cd ( II ) / 2-tbi / GC ) AG 0.46% / kclsat ถูกใช้เป็นขั้วไฟฟ้าอ้างอิงและเคาน์เตอร์ของขั้วไฟฟ้าลวดแพลทินัม ซีดีแรก ( 2 ) ไอออน
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