Abstract-Thecontinuedphysicalfeature size scalingofcomplementaryMetalOxideSemiconductor(CMOS) transistors is
experiencingasperitiesdueto severalfactors, andit is expected
to reach its boundaryatsizeof22nmtechnology by2018.This
paperdiscussesandanalyzesthe mainchallengesandlimitations
of CMOSscaling, not only from physical and technological
point of view, but also from material(e.g., high-k vs. lowk) and economical point of view as well. The paper also
addressesalternativenon-CMOSdevices(i.e., nanodevices)that
arepotentiallyableto solvethe CMOSproblemsandlimitations