Wedemonstratethecrystallizationofthemicrostripsofelectrodepositedamorphousgermanium(Ge)
on grapheneoninsulatorbyrapidmeltinggrowthforthe first time.Growthofsingle-crystallineGe
microstrips with(111)orientationwasconfirmed. Thehighlevelofcompressivestrainwasfoundtobe
resultedfromtheintermixingofCatomsfrommultilayergraphene(MLG)andGe.Probablythein-
troduction oflocalCatomintoGe film enhancesnucleationofGeonMLG,whichresultsin(111)-oriented
Ge nuclei.SubsequentlateralgrowthenablescrystallizationofGewith(111)orientationontheentire
microstrip. Theresultsalsoindicatethatgrapheneisveryusefultosuppressthespontaneousnucleation
in themeltingGe films andthelatticerotationormisorientation.Thisnovelandinnovativetechnique
providesabreakthroughtowardstherealizationofhighqualityGe-on-insulatorstructurestofacilitate
the next-generationultra-large-scaleintegratedcircuits(ULSIs)withmultifunctionalities.