post-annealed optimized ITO thin films on glass substrates with an aeverage thickness of approximately 150 nm and sheet resistance approximately 11.9 ohm per square were supplied from Shenzhen,Chaina.
By using a Carbolite CWF1300 furnace,each fabricated ITO thin film was further treated between 200 and 600 for 20 min
the heat treatment was conducted at atmospheric pressure with a constant influx of atmospheric air .
the optical transmittance and absorbance of the films were measured between wavelengths of 300 nm and 2600 nm with Shimadzu UV-3600 double-beam spectrophotometer at room temperature.
Cascade Microtech 11000B-AP probe station was used to record the sheet resistances of the ITO films before and after the further heat treatment by the 4-pin probe teachnique.
While the Hall effect measurements were performed using the Van der Pauw method.
the surface morphology of the films was characterized using