Preparation of chi film cross-linked by Aglycone Geniposidio Acid [18]
Chitosan solution (1.5% wlv) was prepared in 1.0% (vlv) acetic acid solution. The solution was allowed to stand overnight to remove air bubbles. Then the solution was poured into a glass disk in a dust free-environment and dried in air. The dried film s neutralized by 1 N NaOH solution and washed with phosphate-buffered saline (PBS). Aqueous aGSA solution was prepared. After that chitosan film was immersed in aGSA solution for cross-linking. After 6 h, it was washed with deionized water to remove excess aGSA and dried in air.