Currently, there are two methods of processing
capacitive micromachined ultrasound transducers.
One is the sacrificial layer release process, that is the
sacrificial layer is deposited on the fixed substrate by
the method of growth or deposition; the membrane is
deposited on the surface of the sacrificial layer, and
etching openings through the membrane surface, with
the high selection ratio of the etchant to remove the
sacrificial layer, and the membrane material is
retained. Another is the direct wafer bonding method,
in which two wafers (one having cavity patterning
and the other having the membrane material) are
directly bonded under vacuum [15]. Of these
Micromachining methods, direct wafer bonding
technology is more economical, offers better process
control, higher yield, and more novelties in CMUT
designs than the sacrificial releasing process
Currently, there are two methods of processing
capacitive micromachined ultrasound transducers.
One is the sacrificial layer release process, that is the
sacrificial layer is deposited on the fixed substrate by
the method of growth or deposition; the membrane is
deposited on the surface of the sacrificial layer, and
etching openings through the membrane surface, with
the high selection ratio of the etchant to remove the
sacrificial layer, and the membrane material is
retained. Another is the direct wafer bonding method,
in which two wafers (one having cavity patterning
and the other having the membrane material) are
directly bonded under vacuum [15]. Of these
Micromachining methods, direct wafer bonding
technology is more economical, offers better process
control, higher yield, and more novelties in CMUT
designs than the sacrificial releasing process
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