Conclusion
TZO thin film was deposited on glass substrate by a sol–gel method. The X-ray diffraction pattern confirmed that TZO thin film had a polycrystalline structure. The optical properties indicate that TZO thin film is transparent in the visible region and the band gap of the TZO thin film is found to be about 3.346 eV. The resistivity of the TZO thin film deposited on glass is measured as 3.8 × 104 cm. It can be concluded that TZO thin film can be utilized as a transparent semi-conductive electrode for electro-optical applications.