ZnO films were deposited on the O2 plasma treated polyethersulfone (PES) substrates by atomic layer
deposition. X-ray diffraction (XRD) measurements reveals that the grains in ZnO films show strongly
(0 0 2) preferential orientation, when the duration of plasma pretreatment increases. The decreased
grain size and improved crystallinity results in the decreased surface roughness of ZnO films. In contrast,
when the duration of plasma pretreatment increases to 60 min, the surface roughness increases again
due to the increased grain size and worse crystallinity. In photoluminescence measurement, slight blue
shift of near-band-edge emission occurs with increasing duration of plasma pretreatment up to 30 min.
2013 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights