for the tetrahedral SiO4 structure units, and the bands are usually
assigned to Vd(Si–O–Si), Vs(Si–O–Si) and Vas(Si–O–Si), respectively[18].
The band at 3400 cm1 is assigned to stretching mode of Si–
O–H. In the case of AAO/SBA-15-SH, the 2950–2850 cm1 regions
are assigned to methylene stretching bands [19], indicating that
the 3-MPTS groups have been anchored in the pore channels of
SBA-15 material. The band centered at 2570 cm1 is assigned to
the thiol (–SH) stretching vibrations [12]. The above results
demonstrate that the mercaptopropyl groups are successfully
introduced into the interior mesopore surfaces. For the AAO/SBA-
15-SO3H(C) and AAO/SBA-15-SO3H(G) samples, the band at
2570 cm1 is absent, but the new band at 1650 cm1 which is
assigned to the asymmetric stretching band of the SO2 moieties
[20], is present, which confirms the formation of sulfonic acid
species after the oxidation reactions.
Al
for the tetrahedral SiO4 structure units, and the bands are usuallyassigned to Vd(Si–O–Si), Vs(Si–O–Si) and Vas(Si–O–Si), respectively[18].The band at 3400 cm1 is assigned to stretching mode of Si–O–H. In the case of AAO/SBA-15-SH, the 2950–2850 cm1 regionsare assigned to methylene stretching bands [19], indicating thatthe 3-MPTS groups have been anchored in the pore channels ofSBA-15 material. The band centered at 2570 cm1 is assigned tothe thiol (–SH) stretching vibrations [12]. The above resultsdemonstrate that the mercaptopropyl groups are successfullyintroduced into the interior mesopore surfaces. For the AAO/SBA-15-SO3H(C) and AAO/SBA-15-SO3H(G) samples, the band at2570 cm1 is absent, but the new band at 1650 cm1 which isassigned to the asymmetric stretching band of the SO2 moieties[20], is present, which confirms the formation of sulfonic acidspecies after the oxidation reactions.Al
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