Metal oxidemicrotubes are extensively investigated for many single
tube based applications, such as solid electrolyte materials in microtubular
solid oxide fuel cells [1–3], microflow reactors [4,5], plasma devices
and others, applied under extreme conditions. Functionalization
in order to use the microtubes in mentioned applications requires
their coating with metal or metal oxide layers as electrodes, catalyst
or coatings with low electron emission energy.
In recent decades, MgO thin films have attracted great scientific and
technological interest because of high chemical and thermal stability
(melting point 2900 °C), a wide band gap (7.2 eV), low dielectric constant
(9.8), excellent thermal conductance and demonstrated good diffusion
barrier properties [6]. Recent studies have shown that the surface
of MgO is suitable for the catalytic splitting of water and for hydrogen
generation [7].
MgO thin films have been prepared using a variety of techniques,
such as laser ablation [8], sol–gel coating [9], sputtering [10] and atomic
layer deposition (ALD) [11–14]. Among different thin film techniques,
the ALD has attracted much attention as a technique allowing excellent
conformality and thickness control of deposited films even on the
surfaces with complex shapes, like nanoporous microtubes. MgO is
proposed as a buffer layer to reduce lattice mismatch between substrate
and film grown on the surface by using atomic layer deposition
[11,15–18].
In this study we describe ALD of MgO nanofilms on the basis of
surface modification of nanocrystalline yttria-stabilized zirconia (YSZ)
microtubes. The studies are carried out in order to improve properties
Metal oxidemicrotubes are extensively investigated for many singletube based applications, such as solid electrolyte materials in microtubularsolid oxide fuel cells [1–3], microflow reactors [4,5], plasma devicesand others, applied under extreme conditions. Functionalizationin order to use the microtubes in mentioned applications requirestheir coating with metal or metal oxide layers as electrodes, catalystor coatings with low electron emission energy.In recent decades, MgO thin films have attracted great scientific andtechnological interest because of high chemical and thermal stability(melting point 2900 °C), a wide band gap (7.2 eV), low dielectric constant(9.8), excellent thermal conductance and demonstrated good diffusionbarrier properties [6]. Recent studies have shown that the surfaceof MgO is suitable for the catalytic splitting of water and for hydrogengeneration [7].MgO thin films have been prepared using a variety of techniques,such as laser ablation [8], sol–gel coating [9], sputtering [10] and atomiclayer deposition (ALD) [11–14]. Among different thin film techniques,the ALD has attracted much attention as a technique allowing excellentconformality and thickness control of deposited films even on thesurfaces with complex shapes, like nanoporous microtubes. MgO isproposed as a buffer layer to reduce lattice mismatch between substrateand film grown on the surface by using atomic layer deposition[11,15-18]ในการศึกษานี้ เราอธิบาย ALD MgO nanofilms บนพื้นฐานของเปลี่ยนแปลงพื้นผิวของเสถียร yttria nanocrystalline เซอร์โคเนีย (YSZ)microtubes การศึกษาที่ดำเนินการเพื่อปรับปรุงคุณสมบัติ
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