Regarding the E-beam with magnetron sputtering deposition system, as I mentioned in the last email, YES we can easily do that.
If you look at our past customized system (Magnetron Sputter and E-Beam Evaporator Cluster): http://www.adnano-tek.com/customized-uhv-systems.html
This kind of system is one of our expertise, and we will be able to create a reliable and effective e-beam/magnetron deposition system.
Also, there are several studies that demonstrated that sputtering deposition can be used to deposit SrTiO3 and BiFeO3.
So we think, that it should be no problem. Although, PLD is also a possible option, but sputter/e-beam should also do fine.
Before we give specification and quotation, we have a standard questionaire for all inquiries, please kindly obtain answers for all questions: