Projection lithography using a liquid crystal display (LCD) panel in place of a reticle is expected as a low-
cost reticleless patterning method. However, because LCD had high bright and dark contrasts only in the
wavelength range of longer than 440 nm, thick resists sensitive to ultra violet light were not applicable.
To break this inconvenience, new pattern transfer process was developed. In the new process, tri-layer
composition of OFPR 800, aluminum film and SU-8 were formed. Top-layer OFPR 800 was patterned
using LCD projection lithography without any baking but using the vacuum treatment, and the occur-
rences of wrinkles and cracks of the aluminum films in the conventional processes were completely pre-
vented. It was also verified that the formed patterns were available for electroplating molds, and nickel
micro-parts were fabricated.