In the first part of this work, AISI H13 substrate samples were quenched and tempered to a hardness of 47 HRC. After the heat treatment the H13 specimens went thought low pressure gas nitriding process. The nitriding temperature was fixed at 520 °C while the nitriding time varied from 5 to 9 h. In the nitriding process the goal was to obtain two different nitrided cases with different surface hardness and nitrided case depth as well. These two nitride cases will be referred as case A and case B. The phases formed during the nitriding process were revealed by performing XRD inspection in a Shimadzu XRD-7000 diffractometer. The nitrided cases hardness