shows the variation of resistivity, carrier concentration
and mobility as function of rf power. As the rf power
increases from 100 to 250 W, the resistivity of the films deposited
decreases from 4
×
10−3 to 1
×
10−3 cm, with a corresponding
increase in both the concentration and mobility of carriers.
These data are in line with data revealed by Fig. 11 and corresponding
to AZO sintering targets that reveal higher mobilities
and lower carrier concentrations than the deposited films in good
agreement with the results obtained by Wu et al.12 and Huang
et al.