Silicon wires with fully controlled lengths up to 200 μm
(limited by the scan range of the piezoelectric stage) on both
substrates have been fabricated using either cw or fs lasers.
Fig. 2 SEM images of (a) cw laser deposited silicon line on polysilicon
with a linewidth of around 600 nm. (b) cw laser deposited silicon
line on silicon dioxide with a linewidth around 1.2 μm. (c) fs laser
deposited silicon line on silicon dioxide with a linewidth of around
300 nm. (d) fs laser deposited silicon line on polysilicon with a width
of around 500 nm.
Optical Engineering