Semiconductor based photocatalysis has gained much importance due to its incomparable ability in the environmental detoxification [1–4]. In any photocatalytic process absorption of the near-UV light by the semiconductor is followed by electron (e−) hole (h+) pair generation. These charge carriers can migrate rapidly to the surface of catalyst particles where they are ultimately trapped and poised to undergo redox reaction with suitable substrates. Thus the trapped hole can react with chemisorbed OH− or H2O to produce OH radical species [5, 6]. The reason for the increased interest in the photocatalytic process is the fact that the process is carried out under ambient conditions, and it does not require expensive oxidants and catalyst is inexpensive, nontoxic and can be activated by UV and visible light. Most of the photocatalytic studies use TiO2 as a photocatalyst. In comparison with other promising semiconductors, ZnO appears as a very potential photocatalyst. The design and development of highly efficient photocatalytic materials have attracted the interest owing to their potential applications in the degradation of toxic organic molecules and industrial effluents.In the recent years, the design of photocatalysts impregnatedor embedded onto porous materials with a large surface area is of great significance, which provides high concentration environments of target substances around TiO2 photocatalyst [7, 8]. The most promising support is the activated carbon, because of its high surface area and a well-developed porosity [9, 10].