A new material of plant origin used in photoprotection
is ferulic acid, which belongs to the
group of hydroxycinnamic acids. Rich sources
are cell walls of plants, such as citrus fruits,
wheat, spinach and beets. Ferulic acid is a compound
of low toxicity, absorbed easily and safely
when applied to the skin surface. Reduction in
oxidative stress is achieved by increasing the activity
of enzymes responsible for neutralizing reactive
oxygen species and prevents them from
occurring. It also possesses the ability to absorb
radiation from the entire UVB spectrum and a selected
portion from the UVA, thereby providing
adequate protection against the formation of erythema,
photoaging and development of tumors.