Fig. 8 SiNW transistor arrays fabricated on flexible plastics. (a) DF optical image of a top-gated multi-NW transistor device. Scale bar: 50 mm. Inset,
photograph of a plastic substrate containing 3 3 NWFETs device arrays with each array containing 400 devices. (b) Typical Ids–Vds curves of a multi-
NW FET. (Vg 3 V to 3 V, from top to bottom). (c) Typical Ids–Vg characteristics with Vds at 1 V. Inset, histogram of Ion showing uniform device
characteristics. (d) Histogram of Vt from analysis of over 60 randomly chosen devices in the array. Adapted from Ref. 27.