The increase in concentration of nitrous oxide (N2O) in the atmosphere is one of the major contributors (together with CO2, CH3, ozone, water vapour and freons) to the greenhouse effect and the consequent global warming . The global warming potential of N2O is approximately 300 times higher than CO2 and is the fourth largest contributor to radiative forcing over the past 250 years [2] and [3]. It has been reported that the lifetime of N2O in the atmosphere is horribly long, about 120–150 years [4]. Thus, the concentration of N2O in the atmosphere continuously increases about 0.2–0.3% yearly and majority of this increase seems to connected with the anthropogenic activities [5]. Therefore, finding a method to decompose N2O is very desirable. Photocatalytic decomposition of N2O under UV irradiation on semiconductor photocatalysis is one of the methods for its removal.