remainsunmodified, while a temperature depression of more than 3◦C andless than 6◦C, produces a partially modified Si. A depression ingrowth temperature of more than 6◦C is required to produce a fullymodified Si structure. The present results are in good agreementwith the magnitude of eutectic growth depression for modifiedsilicon morphology as reported by other researchers [14,16]. Thedepression of Al–Si growth temperature can be pertained to actionof free Sr in the melt which obstructs twin plane re-entrant edge(TPRE) growth of silicon [22], which is called impurity inducedtwining (IIT). Therefore, the system needs a greater driving forcefor growth.