We then performed the DP-UV nanoimprinting using NICT110.
A negative tone mold with a line pattern (500-nm line width and
3000-nm spacing) and a 300-nm pattern height was used. A release
agent (OPTOOL HD-1100TH; Daikin Industries, Japan) which
forms a fluorinated antisticking layer (F-ASL) of a few nm thick was
used [14,15]. The NICT110 was diluted with 1-methoxypropylacetate.
The spin-coated NICT110 was prebaked at 90 C for 30 s and
the resulting film thickness was about 200 nm. The first and second
nanoimprinting pressures were 5 MPa.