In summary, n-type bismuth telluride thin films with various layered nanostructures were fabricated by RF magnetron sputtering. The crystal growth rate plays an important role in the controlling the morphologies of the films. Thin films with oriented layered structure, nanoparticles, thicker layers and columnar structure were successfully prepared due to the competition between the crystal growth in the planar direction and the nucleation in radial direction. The films with such special structure also exhibit attractive thermoelectric properties. Optimal TE properties were obtained in the film with oriented layered structure with Seebeck coefficient S ∼ −70 μV/K at room temperature, −85 μV/K at 450 K, and power factor 8.8 μW/cm K2 at room temperature, 11.4 μW/cm K2 at 450 K, respectively.