In most cases, with increasing deposition angle, the deposition
speed must increase in order to deposit a monolayer. Using the
deposition blade having a hydrophobic backside, Vmono increases
almost linearly in order to deposit a monolayer of both 0.5 and
1 μm SiO2 microspheres, as shown in Figure 5a (top row). For
the hydrophilic (bare glass) deposition blade, the optimum speed
needed to form a monolayer is a weak function of deposition
angle. The local minimum at R ≈ 55° is possible evidence of
the pinning of the contact line at the corner on the back side of
the deposition blade. For R < 55°, the three-phase contact line
backside deposition corner is freely moving. In this regime, there
is roughly a linear dependence between blade angle and Vmono.