Multilayer GO/PAH Film Growth. Hydroxylated silicon wafers were primed with one of three different types of cationic
monolayers in order to initiate the growth of the GO films.This was achieved either by (1) reacting with 4-((dimethylmethoxy)silyl)butylamine (15 h treatment with a 5% toluene solution under dry Ar, over KOH at ambient temperature) or by (2) adsorbing a monolayer of aluminum Keggin ions (5 min adsorption from aqueous solution of the chloride salt at 80 °C19)or by (3) adsorbing PAH (15 min adsorption from a 0.01 M aqueous solution at pH 7 and ambient temperature). The primed Si substrates (1, 2, and 3) are designated hereafter as Si(NH2), Si(OH)/Al-Kg, and Si(OH)/PAH, respectively.