Fig. 5: Frit variation of the paste with the frit content of point X and Y in Fig. 4. (a) (c) show EDX Mapping images of a bus bar with an
optimum frit content (point X). (a) shows the SEM image whereas (b) and (c) show the EDX image of silver and oxide, respectively. An
optimum frit content at point X results in a stable glass layer. The glass layer contacts the silicon homogeneously. (d) (f) show the EDX
Mapping image of a bus bar with frit content at point Y. (d) shows the SEM image whereas (e) and (f) show the EDX image of silver and oxide
comparable to (a) (c). The higher frit content of Frit B results in an inhomogeneous glass layer destabilizing the contact between bus bar and
silicon. This results in smaller peel-off forces shown in Fig. 4.