Fig. 3 Equipotential lines for Sphere-sphere electrode under, (a)
Symmetrically applied voltage (b) Asymmetrically applied voltage.
It is revealed from fig. 3(b) that for asymmetrically applied
voltage, the equipotential lines are unevenly distributed in the
inter-electrode gap. Almost the lines show a tendency to
follow the contour of the upper (high voltage) electrode. In
this case, almost all the equipotential lines are shifted towards
the upper electrode, compared to that of the symmetrically
applied voltage. For both the cases of applied voltage, the
lines are very close to each other near the surface of the high
voltage electrodes indicating higher stress is developed at
these points. However, comparing fig. 3(a) and fig. 3(b), it is
revealed that the application of asymmetrical voltage (in
other way to say, grounding one electrode) causes the
dielectric to be stressed more unevenly compared to the case
of symmetrically applied voltage.
2) Equipotential lines for Plane-plane electrode system:
The distribution of the equipotential lines for Plane-plane
electrode system has been shown in fig. 4(a) and fig. 4(b)
respectively for both types of applied voltage. For
symmetrically applied voltage, the equipotential lines are
evenly distributed in the gap whereas for asymmetrically
applied voltage, almost all the lines show a tendency to
follow the contour of the high voltage electrode. The lines are