The post-annealing was carried out for the AuyNiCry
Ta films at 400 8C in Ar gas for 60 min. The critical
characteristic load of AuyNiCryTa films after annealing
is displayed in Fig. 7. There are no obvious changes
between Figs. 7 and 6. So it indicates that the critical
load of metallic films by scratch method was not
sensitive to post-heating process.
The critical load can be affected by the film thickness.
The Au film was fixed to different thickness by plating.
Fig. 8 shows the critical load as a function of the film
thickness of AuyNiCryTa and AuyNiCr films deposited
on Al2O3 substrate. The results show that the critical
load increases approximately linear with film thickness.
In general, if we assume that the adhesion is the same
and the critical load is determined by the extent of the
deformation, an increased film thickness requires an
increased indenting load to obtain the same deformation,
so that the critical load increases with the film thickness.
It can relevant the resistance scratch of films. But,
considering the residual stress effect in the film, the
variation of critical load with film thickness may be
complication. In our experiments, the mean residual
stress state of AuyNiCryTa films can be changed by
plating w9x, so that the effect of residual stress on critical
load is not dominating, the film thickness becomes the
mainly factor which affect the critical load.
The post-annealing was carried out for the AuyNiCryTa films at 400 8C in Ar gas for 60 min. The criticalcharacteristic load of AuyNiCryTa films after annealingis displayed in Fig. 7. There are no obvious changesbetween Figs. 7 and 6. So it indicates that the criticalload of metallic films by scratch method was notsensitive to post-heating process.The critical load can be affected by the film thickness.The Au film was fixed to different thickness by plating.Fig. 8 shows the critical load as a function of the filmthickness of AuyNiCryTa and AuyNiCr films depositedon Al2O3 substrate. The results show that the criticalload increases approximately linear with film thickness.In general, if we assume that the adhesion is the sameand the critical load is determined by the extent of thedeformation, an increased film thickness requires anincreased indenting load to obtain the same deformation,so that the critical load increases with the film thickness.It can relevant the resistance scratch of films. But,considering the residual stress effect in the film, thevariation of critical load with film thickness may becomplication. In our experiments, the mean residualstress state of AuyNiCryTa films can be changed byplating w9x, so that the effect of residual stress on criticalload is not dominating, the film thickness becomes themainly factor which affect the critical load.
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