FISCHERSCOPE® X-RAY XDV®-μ WAFER
Equipped with polycapillary X-ray optics for measurements on very small components
Measurement spot approx. Ø 20 μm (0.8 mils) fwhm at Mo-Kα
Very high intensities and thus good precision even for thin coatings, measurement uncertainty < 1 nm possible
Programmable, motor-driven XY table with vacuum wafer chuck for silicon wafers up to Ø 300 mm (12 in)