which might explain the higher values in hardness obtained for these films. The double stratification of PLD carbon films was assessed in reference to “subplantation”, i.e., implantation of ablated atoms and ions into the subsurface layer of the substrate. The continual bombardment of the substrate with carbon species causes the growth of a dense layer close to the surface. The highly energetic atoms in plasma will continue to penetrate this layer contributing to its densification, or stick on its surface, causing the increase of its thickness.