XRD patterns of three different org

XRD patterns of three different organoclay and E-SBR based
nanocom posites are depicted in (Figs. 2a–2c). Intense peaks were
observed around 2h= 2.71 , 3.14 and 5.10 correspond ing to the
basal spacing of 3.32 nm (dooı), 2.82 nm and 1.76 nm for Cloisite
15A, 20A and 30B respectively (Fig. 2a ). The intense peaks of differ-
ent organoclays has been shifted towards the lower angle
(2h= 1.71 , 1.75  and 4.82 ), correspondi ng to the basal spacing
of 5.19 nm, 4.92 nm and 1.83 nm for XSBR/Cloi site 15A (XC1),
XSBR/Cloi site 20A (XC2) and XSBR/Cloisite 30B (XC3) composites
respectively , which proves the increase in the intergallery spacing
of the different organoclays (Fig. 2b ). This can be attributed to the
intercala ted structure of the XSBR/organocl ay composites [35]. In
addition to the main peak, other accompanyi ng peaks were noticed
for the compatibiliz er/organoclay composites, which may be due
to reaggregation of organoclay platelets in the XSBR matrix. No
such peaks were observed for E-SBR/XC/C B nanocompo sites
(SXC1CB, SXC2CB and SXC3CB) which proves that the organoclay
may be partially exfoliated in the E-SBR matrix in the presence of
CB (Fig. 2c ). For XC3 composites, the peak intensity was also dimin-
ished which indicates the partial exfoliation of Cloisite 30B plate-
lets in the XSBR matrix, which may be due to the better