To facilitate advanced device research and to establish a
device fabrication-friendly culture in the clean room, MiRC is
working to establish a variety of baseline processing sequences.
Currently, a CMOS baseline processing training program is
being offered to graduate students. The baseline processing
training mainly focuses on familiarizing researchers with the
N-well, 2-metal, 2-poly process baseline and its recipes, while
other facets of the CMOS platform will also be introduced. As
of today, there are at least six different research groups that
have participated in complete processing training, and three
research groups are using the CMOS baseline processing to
integrate/fabricate the advanced devices. The syllabus of the
CMOS baseline training is listed hereafter. The whole baseline
training takes approximately 15 weeks on a 4-h/week basis.