The polycrystalline silicon is melted in a fused silica crucible heated by an induction heated graphite suceptor. The graphite heater may alternately be directly driven by a low voltage at high current. In the Czochralski process, the silicon melt is solidified on to a pencil sized monocrystal silicon rod of the desired crystal lattice orientation. (Figure below) The rod is rotated and pulled upward at a rate to encourage the diameter to expand to several inches. Once this diameter is attained, the boule is automatically pulled at a rate to maintain a constant diameter to a length of a few feet. Dopants may be added to the crucible melt to create, for example, a P-type semiconductor. The growing apparatus is enclosed within an inert atmosphere.