The main purpose of this work is the preparation of singlelayered
zirconium oxynitrides, ZrOxNy films and the relationship
between the composition and structure. Thin films, prepared
by DC reactive magnetron sputtering, were characterized
by Raman Spectroscopy (RS), and the results are correlated
with the composition, evaluated by Rutherford Backscattering
spectrometry (RBS), and the structure obtained by X-ray diffraction
(XRD).