The epoxy samples were implanted with heavy ions such as tungsten (W), gold (Au) and lead (Pb) to
investigate the attenuation characteristics of these composites. Near-surface composition depth profiling
of ion-implanted epoxy systems was studied using Rutherford Backscattering Spectroscopy (RBS). The
effect of implanted ions on the X-ray attenuation was studied with a general diagnostic X-ray machine
with X-ray tube voltages from 40 to 100 kV at constant exposure 10 mAs. Results show that the threshold
of implanted ions above which X-ray mass attenuation coefficient, lm of the ion-implanted epoxy composite
is distinguishably higher than the lm of the pure epoxy sample is different for W, Au and Pb