columnlevel
design and pixel-level design.
The process level optimizations include the reduction
of K and CP. For instance, the parameter K has been
reduced, in [2], by using a buried channel SF. In [2] [6],
the parameter CP has been minimised by applying process
refinements reducing the overlap and junction capacitances
connected to the SN. In this work, we use a standard CIS
technology and cannot drastically change these parameters.
Nevertheless, they can be addressed by making a good device
choice among the standard transistors and careful layout, with
respect to the standard design rules, in order to keep the
term CP as low as possible.